http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4859656-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-00 |
| filingDate | 2006-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4859656-B2 |
| titleOfInvention | Film forming method and film forming apparatus |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a film deposition method capable of easily depositing a uniform film without changing the composition of powder. <P>SOLUTION: Regarding the method in this invention, high pressure d.c. voltage is applied to a space between an upper electrode 5 holding a substrate K in which a thin film is formed on the surface and a lower electrode 7 mounted with powder P as a film material in a vessel 3 under a vacuum, so as to form an electrostatic field between both the electrodes 5, 7, and the powder P is reciprocated between both the electrodes 5, 7 by an electric field generated at the electrostatic field, thus the powder P is stuck to the surface of the substrate K, so as to deposit a film. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| priorityDate | 2006-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 14.