http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4815871-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D251-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C271-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C275-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-18 |
| filingDate | 2005-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4815871-B2 |
| titleOfInvention | Resist compound and resist composition |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resist composition which can be used for not only UV rays such as i-line and g-line but for visible rays, excimer laser light such as KrF, extreme UV rays (EUV), electron beams, X rays, and ion beams, to provide a resist compound to be used for the above composition, to provide a nonpolymer-based radiation-sensitive resist composition having high resolution, high heat resistance and solvent solubility in an easy preparation process, and to provide a resist compound to be used for the composition. <P>SOLUTION: The resist composition contains one or more kinds of resist compounds (A) satisfying all of the following conditions. The compound has (a) at least one crosslinking reactive group in the molecule, the group directly or indirectly inducing crosslinking reaction by irradiation with any radiation selected from a group consisting of visible rays, UV rays, excimer laser light, EUV rays, electron beams, X rays and ion beams; (b) one kind or more of functional groups selected from a group consisting of urea groups, urethane groups, amide groups and imide groups in the molecule; (c) 500 to 5,000 molecular weight; and (d) a branched structure. Resist compound satisfying the above conditions are presented. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| priorityDate | 2004-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 528.