http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4695386-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 |
| filingDate | 2004-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4695386-B2 |
| titleOfInvention | Polishing pad, polishing method, semiconductor device manufacturing method, and semiconductor device |
| priorityDate | 2004-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 93.