http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4642813-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-58 |
| filingDate | 2007-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4642813-B2 |
| titleOfInvention | Silicide target for forming gate oxide film having excellent embrittlement resistance and method for manufacturing the same |
| priorityDate | 2000-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.