http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4621525-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4621525-B2 |
| titleOfInvention | Positive resist composition for EUV exposure and pattern forming method using the same |
| priorityDate | 2005-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 204.