http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4527212-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-732 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1999-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2010-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2010-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-4527212-B2 |
titleOfInvention | Acid-sensitive compound and resin composition for photoresist |
priorityDate | 1998-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 303.