Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C25-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D295-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D211-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D215-58 |
filingDate |
2004-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2010-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2010-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-4469692-B2 |
titleOfInvention |
Photosensitive composition, compound used for photosensitive composition, and pattern formation method using the photosensitive composition |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010159256-A |
priorityDate |
2004-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |