http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4433543-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4433543-B2 |
| titleOfInvention | Positive photosensitive polybenzoxazole precursor composition, pattern manufacturing method, and electronic component using the same |
| priorityDate | 2000-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 104.