http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4328251-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1608 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1893 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-2086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-30 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-00 |
| filingDate | 2004-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4328251-B2 |
| titleOfInvention | Conductive pattern forming method |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a high-resolution conductive pattern material which is excellent in production suitability and in durability and conduction stability and to provide a conductive pattern forming method with which the high-resolution conductive pattern which is excellent in durability and conduction stability is manufactured with a simple process excellent in production suitability. <P>SOLUTION: The conductive pattern material is formed by carrying out pattern exposure on a substrate to which a compound having a polymerization initiating site to initiate radical polymerization with photo-cleavage and a substrate bonding site is bonded, deactivating the polymerization initiating site on the exposure region, subsequently bringing an unsaturated compound capable of radical polymerization into contact with the substrate, exposing an entire surface of the substrate, generating the photo-cleavage on the polymerization initiating site remaining on the unexposed region in the pattern exposure and generating a graft polymer by initiating the radical polymerization and subsequently adhering a conductive material to the graft polymer. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| priorityDate | 2004-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.