Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31691 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-407 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4485 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02356 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02197 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
filingDate |
1999-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2009-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2009-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-4212774-B2 |
titleOfInvention |
Low temperature CVD method for forming a ferroelectric film using Bi alkoxide |
priorityDate |
1998-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |