| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
| filingDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2008-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-4188058-B2 |
| titleOfInvention |
Polymer compound for photoresist and resin composition for photoresist |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999630-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130009695-A |
| priorityDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |