| abstract |
Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 containing repeat units with a group of formula (R1) or (R2). Independent claims are also included for (1) photosensitive polymers (IA) with units (a) as above and units (b) derived from (meth)acrylate, maleic anhydride, norbornene, styrene, tetrafluoroethylene and/or sulfur dioxide; and (2) resist preparations containing polymers as above and photo-acid generators (PAG) |