http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4114354-B2
Outgoing Links
Predicate | Object |
---|---|
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2002-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2008-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2008-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-4114354-B2 |
titleOfInvention | Radiation sensitive resin composition |
abstract | <P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency for radiation and excellent basic physical properties as a resist such as sensitivity, resolution, dry etching durability and pattern profile. <P>SOLUTION: The radiation sensitive resin composition contains the following resin and a radiation sensitive acid generator. The resin contains a repeating unit derived from alkyladamantyl (meth)acrylate or a repeating unit derived from mevalonic lactone (meth)acrylate and the resin is insoluble with alkali or hardly soluble with alkali and changed into alkali-soluble by the action of an acid. <P>COPYRIGHT: (C)2003,JPO |
priorityDate | 2002-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 463.