http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4070521-B2
Outgoing Links
Predicate | Object |
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classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2002-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2008-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2008-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-4070521-B2 |
titleOfInvention | Positive resist composition |
abstract | <P>PROBLEM TO BE SOLVED: To provide a positive resist composition which prevents falling of a pattern and ensures improved edge roughness, density dependence and surface roughness in etching. <P>SOLUTION: The positive resist composition comprises a resin containing a repeating unit having a dihydroxy- or trihydroxyadamantyl group and a repeating unit having an acid-decomposable alicyclic group at a specified composition molar ratio and capable of increasing the velocity of dissolution in an alkali developer by the action of an acid and a compound capable of generating an acid upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2003,JPO |
priorityDate | 2001-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 309.