http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3997753-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-02 |
| filingDate | 2001-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3997753-B2 |
| titleOfInvention | Photosensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a new negative photosensitive resin composition developable with a dilute alkali solution and having good resolution, excellent etching resistance and such good removability that it is dissolved in an aqueous alkali solution. SOLUTION: The photosensitive resin composition comprises (A) an alkali- soluble copolymer having a terminal ethylenically unsaturated group and a carboxyl group in a side chain, (B) one or more of the photopolymerizable compounds of formula (1) having at least one polymerizable ethylenically unsaturated group in one molecule and (C) a photopolymerization initiator. In the formula (1), R1 is H or methyl; m is 0, 1 or 2; and R2 is alkylene. |
| priorityDate | 2001-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 98.