http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3965976-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3965976-B2 |
| titleOfInvention | Radiation sensitive resin composition, resin pattern forming method, resin pattern and use thereof |
| abstract | PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having excellent suitability to coating on a substrate and storage stability and from which an electric insulating film excellent in balance of various properties such as flatness, heat resistance, low dielectric property, water absorption resistance, chemical resistance, transparency and solvent resistance can be obtained. SOLUTION: The radiation sensitive resin composition comprises (A) an alicyclic olefin resin, (B) an acid generator, (C) a crosslinker and (D) a solvent containing a glycol solvent such as ethylene glycol monobutyl ether or propylene glycol monoethyl ether. |
| priorityDate | 2001-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 421.