http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3963724-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
| filingDate | 2002-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3963724-B2 |
| titleOfInvention | Method for producing polymer compound for photoresist and resin composition for photoresist |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a polymeric compound for a photoresist highly soluble in a resist solvent comprising a glycol-based solvent, an ester-based solvent, a ketone-based solvent or the like. <P>SOLUTION: The method for manufacturing a polymeric compound for a photoresist exhibiting changes in solubility in an alkali by an action of an acid comprises a step for polymerization using as a polymerization solvent one or more solvents selected among a glycol-based solvent, an ester-based solvent and a ketone-based solvent followed by a filtration treatment of the polymerization reaction liquid containing the resultant polymer. Preferably, the polymerization solvent is at least one selected among propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, ethyl lactate and methyl isobutyl ketone. <P>COPYRIGHT: (C)2003,JPO |
| priorityDate | 2002-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 124.