http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3868686-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
| filingDate | 1999-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3868686-B2 |
| titleOfInvention | Photoresist pattern forming method with reduced defects and developer for reducing defects |
| priorityDate | 1999-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.