http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3861679-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3861679-B2 |
| titleOfInvention | Radiation sensitive resin composition |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having a high resolution and a high radiation transmittance as a chemically amplified resist sensitive to an actinic radiation such as KrF excimer laser, ArF excimer laser, F<SB>2</SB>excimer laser or far UV typified by EUV (extreme-ultraviolet radiation). <P>SOLUTION: The radiation-sensitive resin composition is characterized in containing (A) a polymer component comprising a repeating unit derived from a tetrahydrofuranyl-containing (meth)acrylate, a repeating unit derived from a hydroxystyrene or the like and a repeating unit containing an acid-dissociable group and (B) a radiation-sensitive acid generator. <P>COPYRIGHT: (C)2003,JPO |
| priorityDate | 2001-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 618.