http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3844770-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 2005-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3844770-B2 |
| titleOfInvention | Silicon oxide film evaluation method and apparatus, and semiconductor device manufacturing method and apparatus |
| priorityDate | 2005-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.