http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3841399-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3841399-B2 |
| titleOfInvention | Positive resist composition |
| abstract | A positive resist composition comprising: (A) a resin which comprises a repeating unit represented by the following formula (I): <CHEM> wherein R1 represents a hydrogen atom or an alkyl group, A1 represents a single bond or a linking group, R2 represents an alkylene group, and X represents an alkoxy group or a hydroxyl group, and exhibits an increased rate of dissolution in an alkali developing solution by an action of an acid; and (B) a compound capable of generating an acid on exposure to active light rays or a radiation. |
| priorityDate | 2002-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 360.