http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3688469-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1998-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3688469-B2 |
| titleOfInvention | Positive photoresist composition and method for forming resist pattern using the same |
| priorityDate | 1998-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 222.