Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-22 |
filingDate |
1999-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2005-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2005-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-3672780-B2 |
titleOfInvention |
Positive resist composition and pattern forming method |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7368220-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8697329-B2 |
priorityDate |
1999-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |