http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3642841-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 1995-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3642841-B2 |
| titleOfInvention | Etching method and manufacturing method of semiconductor device |
| priorityDate | 1994-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.