| Predicate |
Object |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2000-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2004-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-3525882-B2 |
| titleOfInvention |
Plasma CVD apparatus and film forming method |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106795626-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106795626-B |
| priorityDate |
2000-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |