http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3503640-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2003-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3503640-B2 |
| titleOfInvention | Photosensitive resin composition |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can form a resist pattern having high resolution and a high aspect ratio. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one ethylenic unsaturated bond in the molecule and (C) a photopolymerization initiator. The composition contains N,N'-tetraalkyl-4,4'-diaminobenzophenone as the component (C) by 0.04 to 0.08 pts.wt. with respect to the total 100 pts.wt. of the component (A) and the component (B). <P>COPYRIGHT: (C)2003,JPO |
| priorityDate | 2000-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 147.