http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3416876-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3416876-B2 |
| titleOfInvention | Chemically amplified positive resist base resin and resist pattern forming solution using the same |
| priorityDate | 2001-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 227.