| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate |
1995-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2003-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-3404536-B2 |
| titleOfInvention |
Method for forming integrated circuit by low-temperature plasma enhancement |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101037533-B1 |
| priorityDate |
1994-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |