Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3475 |
filingDate |
2001-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2003-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2003-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-3374380-B2 |
titleOfInvention |
Cross-linkable high-resolution photoresist composition that can be used with a high base aqueous solution developer and method of forming a photoresist pattern using the composition |
priorityDate |
2000-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |