http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-3157911-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 |
| filingDate | 1992-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2001-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-3157911-B2 |
| titleOfInvention | Heat treatment method for compound semiconductor substrate and heat treatment apparatus therefor |
| priorityDate | 1992-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.