http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022522226-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76879 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76876 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2020-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2022522226-A |
| titleOfInvention | Tungsten deposits with high step coverage |
| abstract | PROBLEM TO BE SOLVED: To provide a method for depositing a tungsten nucleation layer which realizes very excellent step coverage. The method comprises a sequence of alternating pulses of tungsten-containing precursor and boron-containing reducing agent while flowing hydrogen (H2) and boron-containing reducing agent in parallel. The H2 stream is stopped before the tungsten-containing precursor stream. Flowing H2 in parallel with the boron-containing reducing agent rather than the tungsten-containing precursor stream reduces parasitic CVD components and results in a more self-restraining process. This in turn improves the step coverage and conformability of the nucleation layer. Related equipment is also provided. [Selection diagram] Fig. 2 |
| priorityDate | 2019-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.