abstract |
An object of the present invention is to provide a salt, an acid generator and a resist composition capable of producing a resist pattern with good CD uniformity (CDU). A salt represented by formula (I), an acid generator and a resist composition. [In the formula, R 4 to R 9 represent a halogen atom or the like. A 1 , A 2 and A 3 each represent a hydrocarbon group or the like. m1, m4, m5, m6 and m7 represent 0 to 5, m2, m3, m8 and m9 represent 0 to 4, and 1 or more of m1 to m3 represents an integer of 1 or more. X 4 represents a single bond, -CH 2 - or the like. AI − represents an organic anion. ] [Selection figure] None |