http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022157637-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2021-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d26202d366193a30f2471879d7ce63b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb1e0e86c2cf7848714344e42591e60b |
| publicationDate | 2022-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2022157637-A |
| titleOfInvention | Coating agent for planarizing pattern reversal containing silicon |
| abstract | Kind Code: A1 A pattern reversal material having high etching resistance, good filling properties between resist patterns, and capable of forming a cured film having excellent planarization properties in line portions and space portions of a resist pattern, and the material. to provide a reverse patterning method using (A) a modified polysiloxane comprising a hydrolytic condensate of a hydrolyzable silane, in which at least a portion of the silanol groups of the modified polysiloxane are capped; (B) a curing catalyst; (C) an organic solvent that does not damage the resist film; [Selection figure] None |
| priorityDate | 2021-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 617.