http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022142294-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2021-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf6c7439a8cc1c8281484011b80e12b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cdf39399383d365afba42fb0f9779da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5eadd94620d83c0d11d0df83051cb40 |
| publicationDate | 2022-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2022142294-A |
| titleOfInvention | Manufacturing method of three-dimensional mold, and negative resist composition for gradation exposure |
| abstract | A negative for gradation exposure, which can be developed with alkali, is suitable for gradation exposure by easily controlling the height of convex portions according to the amount of exposure, and can form a three-dimensional pattern with excellent resolution. Another object of the present invention is to provide a mold resist composition. The phenolic hydroxyl group has two or more phenolic hydroxyl groups in one molecule, and one or more substituents selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group are placed in the ortho position of the phenolic hydroxyl group in one molecule. A negative resist composition containing a phenolic compound (A) having a molecular weight of 400 to 2500 and having two or more phenolic compounds (A) in the total solid content of the negative resist composition, wherein the content of the phenolic compound (A) is 70 A step of applying a non-chemically amplified negative resist composition having a weight percentage or more and substantially not containing an acid generator onto a substrate, followed by heat treatment to form a resist film; , gradational exposure and development. [Selection figure] None |
| priorityDate | 2021-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 261.