http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022130325-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2022-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f91324d08167e9ac506b36ec2f0125c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1966666d17e062db31fcc6467555336 |
publicationDate | 2022-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2022130325-A |
titleOfInvention | RESIST COMPOSITION AND RESIST PATTERN MANUFACTURING METHOD |
abstract | An object of the present invention is to provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU). A resist composition comprising a compound represented by formula (I), a resin having an acid-labile group, and an acid generator. [In the formula, R 1 represents *-OR 10 , *-O-CO-R 10 or the like. L 1 represents a single bond or an optionally substituted alkanediyl group. R10 represents a base labile group. R 2 represents *-L 1 -OH, *-L 1 -CO-OH or the like. R3 represents a halogen atom , haloalkyl group or alkyl group. m2 represents an integer of 0-5, and m3 represents an integer of 0-5. However, 0≦m2+m3≦5. ] [Selection figure] None |
priorityDate | 2021-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.