http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022100188-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 |
filingDate | 2021-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_632143bb4bef1e002d6e83376e842f7a |
publicationDate | 2022-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2022100188-A |
titleOfInvention | Resist composition and resist pattern forming method |
abstract | PROBLEM TO BE SOLVED: To provide a resist composition capable of forming a resist pattern having high sensitivity, CDU and good resolution, and a resist pattern forming method using the resist composition. A resist composition containing a polymer compound having a structural unit (a01) derived from a compound represented by the general formula (a0-1). In the formula, W 01 is a polymerizable group-containing group. C t is a tertiary carbon atom, and X t is a group that forms a monocyclic or polycyclic hydrocarbon group together with C t . A part or all of the hydrogen atom of the monocyclic or polycyclic hydrocarbon group may be substituted with a substituent, or a part of the carbon atom constituting the ring may be substituted with a heteroatom. Ra 01 is a linear, branched, or cyclic aliphatic hydrocarbon group. [Selection diagram] None |
priorityDate | 2020-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 354.