http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022097422-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate | 2021-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1966666d17e062db31fcc6467555336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate | 2022-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2022097422-A |
titleOfInvention | Method for manufacturing resist composition and resist pattern |
abstract | PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having good CD uniformity (CDU). A resist composition containing a compound represented by the formula (I), a resin having an acid unstable group, and an acid generator. [In the formula (I), L 1 represents a (m2 + 1) -valent hydrocarbon group having 1 to 24 carbon atoms which may have a substituent. Ar 1 and Ar 2 each independently represent an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent. R 1 and R 2 independently represent a hydrogen atom or an acid unstable group, respectively. m2 represents an integer of 2 to 7, and when m2 is 2 or more, a plurality of Ar 2 and R 2 may be the same or different from each other. ] [Selection diagram] None |
priorityDate | 2020-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.