http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022063233-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B55-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2021-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ffaa8af3a6286ecfe03c45489f75058 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1983851c4f99e1d9422d7c7592123102 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c3cdd03ae1600d359c955988a012567 |
| publicationDate | 2022-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2022063233-A |
| titleOfInvention | Abrasive liquid composition for silicon substrate |
| abstract | PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a silicon substrate, which can improve the polishing speed, reduce the surface roughness (haze) of the silicon substrate, and achieve the storage stability of a concentrate in one embodiment. SOLUTION: In one embodiment, the present disclosure relates to a polishing liquid composition for a silicon substrate, which contains the following component A, the following component B and the following component D, and has a pH of more than 8.5 and 14 or less. Component A: Silica particle component B: Amino group-containing water-soluble polymer having a pKa of 5 or more and 8.5 or less Component D: Nonionic water-soluble polymer [Selection diagram] None |
| priorityDate | 2020-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.