http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022041890-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbdfa36b677f4ef61245ca725011e221 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2021-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a68008d5ddfb5743620ab77f7b1e662e |
| publicationDate | 2022-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2022041890-A |
| titleOfInvention | Method for forming photosensitive resin laminate and resist pattern |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive resin laminate excellent in at least one of minimum development time, resolution, amount of side edge (SE), contrast and bleeding property. SOLUTION: A support and the following components: (A) an alkali-soluble resin, (B) a photopolymerizable compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, (D) a light wavelength of 550 to 700 nm. It has a photosensitive resin composition layer formed on the support using a photosensitive resin composition containing a compound for increasing the absorbance of the light, and (E) an organic color developer, and has a photosensitive resin composition. A photosensitive resin laminate characterized in that the thickness of the material layer is more than 0 and 10 μm or less. [Selection diagram] None |
| priorityDate | 2020-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 276.