Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
filingDate |
2021-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2022-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2022031347-A |
titleOfInvention |
Positive photosensitive polysiloxane composition |
abstract |
PROBLEM TO BE SOLVED: To produce a cured film having a highly smooth surface in which wrinkles are suppressed without adding a curing aid or performing full exposure. A positive photosensitive polysiloxane composition. And the provision of manufacturing methods using it. SOLUTION: (I) a polysiloxane, (II) a carboxylic acid compound which is a monocarboxylic acid or a dicarboxylic acid at 200 to 50,000 ppm based on the total mass of the composition, (III) a diazonaphthoquinone derivative, and (IV). ) A positive photosensitive polysiloxane composition containing a solvent, and a method for producing a cured film using the composition. [Selection diagram] Fig. 1 |
priorityDate |
2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |