http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022031162-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate | 2021-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f84e7351342755ed660021f7a060ca42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate | 2022-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2022031162-A |
titleOfInvention | Method for manufacturing resist composition and resist pattern |
abstract | PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having good CD uniformity. SOLUTION: The compound represented by the formula (I), at least one kind of the structural unit represented by the formula (a1-0), the formula (a1-1) and the formula (a1-2), and the formula (a3). A resist composition containing a resin having an acid unstable group containing the structural unit represented by -4) and an acid generator. [In the formula, L 1 is a (m2 + 1) -valent aliphatic hydrocarbon group which may have a substituent; R 1 is a hydrogen atom or an acid unstable group; R 2 is H, * -OH or * -O-. R 1 ] [Selection diagram] None |
priorityDate | 2020-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 231.