http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021503684-A
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
filingDate | 2018-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2021503684-A |
titleOfInvention | Compositions and Methods for Polishing Memory Hard Disks with Reduced Surface Scratches |
abstract | The present invention comprises a combination of (a) wet silica, (b) (i) an alcohol of formula (I) and an alcohol of formula (ii) (II), (c) hydrogen peroxide, and (d). A chemical mechanical polishing composition containing mineral acid and (e) water is provided, and the polishing composition has a pH of about 1 to about 5. The present invention also brings the substrate into contact with the polishing pad and the chemical mechanical polishing composition, moves the polishing pad and the polishing composition against the substrate, and grinds at least a portion of the substrate to polish the substrate. Also provided are methods of chemical mechanical polishing, especially on nickel-phosphorus substrates. |
priorityDate | 2017-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 101.