http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021196427-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 |
| filingDate | 2020-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ccf0884117b3286a18d0d296be85129 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03a6f074a14a7755f42175687c6ce2ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a307eeae2f2800ffaeaefd0052153a7 |
| publicationDate | 2021-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021196427-A |
| titleOfInvention | Radiation-sensitive compositions, insulating films for display devices, display devices, methods for forming insulating films for display devices, and polymers. |
| abstract | PROBLEM TO BE SOLVED: To obtain a cured film having sufficient lithography performance and having sufficient etching chemical solution resistance and oxygen ashing resistance even by heating at a relatively low temperature (for example, 120 ° C. or lower), the above-mentioned feeling. An insulating film for a display device and a display device obtained by using a radiation-sensitive composition, a method for forming an insulating film for a display device using the radiation-sensitive composition, and a polymer suitable as a component of the radiation-sensitive composition. I will provide a. The radiation-sensitive composition of the present invention is a polymer containing (A) an aromatic ring or a condensed ring and having a weight average molecular weight of 1,000 to 100,000, and has the following formula (1a), (1a). A radiation-sensitive resin composition containing a polymer having at least one group selected from the groups 1b), (2a) and (2b), (B) a radiation-sensitive radical initiator, and (C) an organic solvent. [Selection diagram] Fig. 1 |
| priorityDate | 2020-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID240147 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID424550637 |
Total number of triples: 24.