http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021190700-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 |
| filingDate | 2021-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bab68a29c34e60142507c0a6de17474 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6c4ca6f8a1cee642ff730d5951140e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_795e623010ec4824a88596b6a27b40bf |
| publicationDate | 2021-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021190700-A |
| titleOfInvention | Polyimide resin etching method |
| abstract | PROBLEM TO BE SOLVED: To provide an etching method of a polyimide resin capable of suppressing the generation of unetched portions even in a small-diameter opening process in which the opening diameter of the polyimide resin is Φ100 μm or less. SOLUTION: The etching method of a polyimide resin has a pretreatment step with a treatment liquid, an etching step for etching a polyimide resin with an etching liquid, and a water washing step with a water washing liquid in this order, and the pretreatment liquid is 2.5. It is an acidic aqueous solution containing ~ 7.5% by mass of an anionic surfactant, and the etching solution is 25 to 45% by mass of an alkali metal hydroxide as a first component and 10 to 40% by mass as a second component. It contains% ethanolamine compound, and the temperature of the washing liquid is 70 ° C. or higher. [Selection diagram] None |
| priorityDate | 2020-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 126.