| abstract |
PROBLEM TO BE SOLVED: To provide a compound, a resin and a resist composition containing the same, which can produce a resist pattern having good CD uniformity (CDU). SOLUTION: A compound, a resin and a resist composition represented by the formula (I). [R 5 represents a hydrogen atom, an alkylcarbonyl group having a C number of 2 to 6, or an acid unstable group. m2 is 1 to 4, m4 is 0 to 3, m5 is 1 or 2, but 2 ≦ m2 + m4 + m5 ≦ 5. ] [Selection diagram] None |