| abstract |
PROBLEM TO BE SOLVED: To provide a compound, a resin and a resist composition containing the same, which can produce a resist pattern having good CD uniformity (CDU). SOLUTION: A compound, a resin and a resist composition represented by the formula (I). [In the formula, L 1 represents a single bond or -CO-O- *. R 5 represents a hydrogen atom, an alkylcarbonyl group or an acid unstable group. m2 and m3 represent integers 1 to 3, and m5 represents 1 or 2. However, 3 ≦ m2 + m3 + m4 + m5 ≦ 5. ] [Selection diagram] None |