http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021182042-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C323-29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C323-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C319-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2020-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_164dc69fc7a29d8ef9a68fac4f41772f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c788af3fd0e79721d5564f64728cea41 |
| publicationDate | 2021-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021182042-A |
| titleOfInvention | Chemically amplified photosensitive composition, photosensitive dry film, method for producing a patterned resist film, method for producing a plated model, compound, and method for producing a compound. |
| abstract | PROBLEM TO BE SOLVED: To suppress a fluctuation in the dimensions of a patterned resist film due to a difference in the thickness of the resist film when forming a patterned resist film on a metal surface in a substrate. A method for producing a photosensitive dry film, a patterned resist film, a method for producing a plated product, a compound preferably used in the above-mentioned chemically amplified photosensitive composition, and the above-mentioned chemically amplified photosensitive composition. To provide a method for producing a compound preferably used in a sex composition. SOLUTION: A chemically amplified photosensitive composition containing an acid generator (A) that generates an acid by irradiation with active light or radiation has a molar absorption coefficient ε of 3000 or more at a wavelength of 365 nm and has a metal coordination property. A compound having a group (C1) or a precursor compound thereof (C2) is blended. [Selection diagram] None |
| priorityDate | 2020-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 838.