http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021182041-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate | 2020-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8859deba85181e091fa6117591d03352 |
| publicationDate | 2021-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021182041-A |
| titleOfInvention | A positive photosensitive resin composition, a method for forming a patterned resist film, and a patterned resist film. |
| abstract | PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition having excellent depth of focus characteristics and excellent resolution, a method for forming a patterned resist film using the positive photosensitive resin composition, and the above-mentioned positive. To provide a patterned resist film made of a type photosensitive resin composition. SOLUTION: In a positive photosensitive resin composition containing an alkali-soluble resin (A) and a quinone-diazide group-containing compound (B), two kinds of quinone-diazide group-containing compounds having a specific structure are contained in combination in a specific ratio. A quinonediazide group-containing compound (B) is used. [Selection diagram] None |
| priorityDate | 2020-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 206.