| abstract |
PROBLEM TO BE SOLVED: To provide a resist material having high sensitivity and less likely to cause nanobridge and pattern collapse. An iodinated aromatic carboxylic acid type pendant group-containing polymer containing a repeating unit represented by the following formula (A). (In the formula, RA is H or methyl group, RL is H or acid unstable group, R 1 is a single bond or C1-6 alkanediyl group, X 1A is a single bond, phenylene group, naphthalenediyl. Group or -C (= O) -O-R 2- , R 2 is a saturated hydrocarbylene group, phenylene group or naphthalenediyl group of C1-10, X 1B is -O- or -N (R)- , R is a saturated hydrocarbyl group of H or C1-4, m is 1-3, n is 1 or 2.) [Selection diagram] None |