http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021172842-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b657bae7c6ba14f228fefd2393ecc834 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-83 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 |
filingDate | 2020-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd9d561489f2f3a48674eebcbe06107f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_484412ea5917fc656a08d696ac4c63d8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef523c5269af59cb868d59682730908e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99f2378fc19503320c450ad43a4331aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6081002e2f4f71e5782958168c298b0 |
publicationDate | 2021-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2021172842-A |
titleOfInvention | Method for manufacturing base material with water- and oil-repellent layer, vapor-deposited material and base material with water- and oil-repellent layer |
abstract | PROBLEM TO BE SOLVED: To provide a base material with a water-repellent oil-repellent layer, a vapor-deposited material, and a base material with a water-repellent oil-repellent layer, which are excellent in abrasion resistance of the water-repellent oil-repellent layer. A base material 10 with a water-repellent oil-repellent layer of the present invention is a base material having a base material 12, a base layer 14, and a water-repellent oil-repellent layer 16 in this order, and is water-repellent. The water-repellent layer is composed of a condensate of a fluorine-containing compound having a reactive silyl group, and the underlying layer contains an oxide containing silicon and a Group 5 element of the periodic table, which is lower than the molar concentration of silicon in the underlying layer. The ratio of the molar concentrations of Group 5 elements in the formation is 0.005-2.00. [Selection diagram] Fig. 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023140105-A1 |
priorityDate | 2020-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 102.